Product Description
Suzhou Pudee is a small and below-the-radar company that has been engaged in the research and development of advanced medical technology for over ten years.
Since 2021, we started to focused on the research and development of photolithography materials especially photoresist materials such as Photoacid Generator(PAG) and Photoresist Monomers, most of them are used for I-line, ArF, KrF, DUV etc.
At present, we have developed nearly twenty performance chemicals, most of them are top quality with more than 99.5% purity and the cost is very reasonable and acceptable.